Browse "MS-Journal Papers(저널논문)" by Subject O2-CF4
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| Effects of the polymer residues on via contact resistance after reactive ion etching Ko, HS; Nah, JW; Paik, Kyung-Wook; Park, Y, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.20, no.3, pp.1000 - 1007, 2002 |
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