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Optical properties of thin amorphous silicon film on a phase shift mask for 157 nm lithography

Kim, SungKwan; Kim, YangSoo; Choi, YoungMin; Choi, JongWan; Hong, Jongin; Shon, JungMin; Sung, Tae-Hyun; et al, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.43, no.5A, pp.2523 - 2529, 2004-05

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