Browse "MS-Journal Papers(저널논문)" by Subject 157 nm
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| Optical properties of Si-O-N-F films as a phase shift mask material for 157 nm optical lithography Kim, SK; Kang, MA; Sohn, JM; Kim, SH; No, Kwangsoo, OPTICAL MATERIALS, v.22, no.4, pp.361 - 367, 2003-06 |
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