Browse "MS-Journal Papers(저널논문)" by Author Yoon, HS
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| Chromium aluminum oxide films for ArF line high transmittance attenuated phase shifting mask application Kim, E; Moon, SY; Kim, YH; Yoon, HS; No, Kwangsoo, OPTICAL ENGINEERING, v.39, no.11, pp.2947 - 2955, 2000-11 |
| Effects of growth interruption on high indium content InGaN/GaN multi quantum wells Cheong, MG; Choi, RJ; Kim, CS; Yoon, HS; Hong, CH; Suh, EK; Lee, HJ; et al, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.38, no.6, pp.701 - 705, 2001-06 |
| Simulation of optical constants range of high-transmittance attenuated phase-shifting masks used in KrF laser and ArF laser Kim, E; Moon, SY; Kim, YH; Yoon, HS; No, Kwangsoo, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.39, no.11, pp.6321 - 6328, 2000-11 |
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