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Application of DV-Xa Cluster Method to the Cr-Al Oxide Mask Materials for Deep UV Lithography

Jiang, Zhong-Tao; Yamaguchi, Tomuo; Kim, Eunah; Hong, Seung Bum; No, Kwangsoo; Kang, Young Seog; Park, Soon Ja; et al, BULLETIN OF THE SOCIETY FOR DISCRETE VARIATIONAL XA, v.10, no.2, pp.22 - 26, 1997-01

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