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Growth behavior and thermal stability of epitaxial CoSi2 layer from cobalt-carbon films on (100) Si substrate Rhee, HS; Ahn, Byung Tae; Sohn, DK, JOURNAL OF APPLIED PHYSICS, v.86, no.6, pp.3452 - 3459, 1999-09 |
Low-temperature crystallization of amorphous Si films by metal adsorption and diffusion Sohn, DK; Lee, JN; Kang, SW; Ahn, Byung Tae, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.35, no.2B, pp.1005 - 1009, 1996-02 |
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