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Synthesis and evaluation of novel organoelement resists for EUV lithography

Dai, J.; Ober, C.K.; Kim, Sang Ouk; Nealey, P.; Golovkina, V.; Shin, J.; Wang, L.; et al, PROCEEDINGS OF SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, v.5039 II, no.0, pp.1164 - 1172, 2003

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