Showing results 1 to 3 of 3
Application of DV-Xa Cluster Method to the Cr-Al Oxide Mask Materials for Deep UV Lithography Jiang, Zhong-Tao; Yamaguchi, Tomuo; Kim, Eunah; Hong, Seung Bum; No, Kwangsoo; Kang, Young Seog; Park, Soon Ja; et al, BULLETIN OF THE SOCIETY FOR DISCRETE VARIATIONAL XA, v.10, no.2, pp.22 - 26, 1997-01 |
Investigation on Applicability of Chromium Based Materials to Attenuated Phase shift Mask for DUV Exposure Hong, Seung Bum; Kim, Eun Ah; Jiang, Zhong Tao; Bae, Byeong-Soo; No, Kwangsoo; Shin, Woo Suck; Lim, Sung Chul; et al, PROCEEDINGS OF SPIE, v.2793, no.I34, pp.134 - 137, 1996-04 |
Study on Stability of CrFx Flms for Phase Shifting Mask Kim, Eun Ah; Hong, Seung Bum; Jiang, Zhong Tao; No, Kwangsoo; Lim, Sung Chul; Woo, Sang Gyun; Koh, Young Bum, PROCEEDING OF SPIE, 1997 |
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