Showing results 3 to 4 of 4
Simulation and fabrication of attenuated phase-shifting masks: CrFx Kim, E; Hong, Daniel Seungbum; Kim, KS; Jiang, ZT; Kim, DW; Lim, S; Woo, SG; et al, APPLIED OPTICS, v.36, no.28, pp.7247 - 7256, 1997-10 |
Single-layer halftone phase-shifting masks for DUV microlithography: Optical property simulation and chromium compound film preparation Jiang, ZT; Hong, Daniel Seungbum; Kim, E; Bae, Byeong-Soo; Lim, S; Woo, SG; Koh, YB; et al, APPLIED SURFACE SCIENCE, v.113, pp.680 - 684, 1997-04 |
Discover