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Reaction characteristics between Cu thin film and RF inductively coupled Cl-2 plasma without/with UV irradiation Kwon, MS; Lee, JeongYong; Choi, KS; Han, CH, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.7, pp.4103 - 4108, 1998-07 |
Structure of SiO2 Films Grown at Low Temperature by Inductively Coupled Plasma Oxidation with Oxygen Gas Choi, Yong Woo; Ahn, Jin Hyung; Ahn, Byung Tae, ELECTRONIC MATERIALS LETTERS, v.1, no.2, pp.97 - 102, 2005-12 |
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