Showing results 5 to 7 of 7
Influence of film density on residual stress and resistivity for Cu thin films deposited by bias sputtering Choi, HM; Choi, Si-Kyung; Anderson, O; Bange, K, THIN SOLID FILMS, v.358, no.1-2, pp.202 - 205, 2000-01 |
Metallorganic chemical vapor deposition of metallic Ru thin films on biaxially textured Ni substrates using a Ru(EtCp)(2) precursor Tian, HY; Chan, HLW; Choy, CL; Choi, JW; No, Kwangsoo, MATERIALS CHEMISTRY AND PHYSICS, v.93, pp.142 - 148, 2005-09 |
Structural and electrical characteristics of highly textured oxidation-free Ru thin films by DC magnetron sputtering Tian, HY; Wang, Y; Chan, HLW; Choy, CL; No, Kwangsoo, JOURNAL OF ALLOYS AND COMPOUNDS, v.392, pp.231 - 236, 2005-04 |
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