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Growth behavior and thermal stability of epitaxial CoSi2 layer from cobalt-carbon films on (100) Si substrate Rhee, HS; Ahn, Byung Tae; Sohn, DK, JOURNAL OF APPLIED PHYSICS, v.86, no.6, pp.3452 - 3459, 1999-09 |
In situ growth of an epitaxial CoSi2 layer on a Si(100) substrate by reactive chemical-vapor deposition using a cobalt metallorganic source Rhee, HS; Ahn, Byung Tae, APPLIED PHYSICS LETTERS, v.74, no.21, pp.3176 - 3178, 1999-05 |
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