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Atomic Layer Deposition of Aluminum Thin Films Using an Alternating Supply of Trimethylaluminum and a Hydrogen Plasma Lee, Yong Ju; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.5, no.10, pp.C91 - C93, 2002-08 |
Effect of temperature and substrate on the growth behaviors of chemical vapor deposited Al films with dimethylethylamine alane source Jang, TW; Moon, W; Baek, JT; Ahn, Byung Tae, THIN SOLID FILMS, v.333, no.1-2, pp.137 - 141, 1998-11 |
Effects of deposition parameters on composition, structure, resistivity and step coverage of TiN thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition Kim, JS; Lee, EJ; Baek, JT; Lee, Won-Jong, THIN SOLID FILMS, v.305, no.1-2 , pp.103 - 109, 1997-04 |
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