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Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer Jung, Yeon Sik; Ross, CA, NANO LETTERS, v.7, no.7, pp.2046 - 2050, 2007-07 |
Si-containing block copolymers for self-assembled nanolithography Ross, CA; Jung, Yeon Sik; Chuang, VP; Ilievski, F; Yang, JKW; Bita, I; Thomas, EL; et al, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.26, no.6, pp.2489 - 2494, 2008-11 |
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