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EFFECTS OF F+ IMPLANTATION ON THE CHARACTERISTICS OF POLY-SI FILMS AND LOW-TEMPERATURE N-CH POLY-SI THIN-FILM TRANSISTORS PARK, JW; Ahn, Byung Tae; LEE, K, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.34, no.3, pp.1436 - 1441, 1995-03 |
RECRYSTALLIZATION OF LPCVD AMORPHOUS SI FILMS USING F+ IMPLANTATION PARK, JW; MOON, DG; Ahn, Byung Tae; Lim, Ho Bin; Lee, Kwyro, THIN SOLID FILMS, v.245, no.1-2, pp.228 - 233, 1994-06 |
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