Browse "MS-Conference Papers(학술회의논문)" by Author Woo, SG
Showing results 1 to 5 of 5
| An Overview and Future Development of Single-Layer Halftone Phase-shifting Mask (SLHTPSM) Materials for DUV Microlithography 배병수; Jiang, ZT; 홍승범; Kim, EH; Lim, SC; Woo, SG; 고영범; et al, 한국요업학회 추계학술발표대회 , 한국요업학회, 1996 |
| Cr-Based Attenuated Phase Shifting Mask Materials for 193 nm Lithography No, Kwangsoo; Kim, E; Hong, SB; Jiang, ZT; Lim, S; Woo, SG; Koh, YB, Second Inter. sympo. on 193 nm Lithography86, 1996-01-01 |
| Investigation on Applicability of Chromium-based Materials to Attenuated Phase Shift Mask for DUV Exposure Bae, Byeong-Soo; No, Kwangsoo; Hong, S; Kim, E; Jiang, ZT; Woo, SG; Koh,YB, pp.134 - 137, 1996-01-01 |
| Single-Layer Halftone Phase-Shifting Masks for DUV Microlithography : Optical Property Lation and Chromium Compound Film Preparation No, Kwangsoo; Bae, Byeong-Soo; Jiang, ZT; Song, S; Kim, E; Bae, BS; Lim, SC; et al, Eighth International Conference on Solid Films and Surfaces, 1996-01-01 |
| Study on Stability of CrFx Flms for Phase Shifting Mask No, Kwangsoo; Kim, E; Hong, S; Jiang, ZT; Lim, S; Woo, SG; Koh, YB, '97 Photomask , pp.294 - 297, 1997-01-01 |
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