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Characteristics of SiO2 film grown by atomic layer deposition as the gate insulator of low-temperature polysilicon thin-film transistors

Lee, WJ; Chun, MH; Cheong, KS; Park, KC; Park, Chong-Ook; Cao, G; Rha, SK, IUMRS International Conference in Asia 2006, IUMRS-ICA 2006, v.124-126, no.PART 1, pp.247 - 250, 2006-09-10

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