고속 열 확산 공정에 의해 형성된 Phosphorus Source/Drain을 갖는 NMOS 트랜지스터의 특성

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dc.contributor.author조병진ko
dc.contributor.author김정규ko
dc.contributor.author김충기ko
dc.date.accessioned2013-02-25T07:22:39Z-
dc.date.available2013-02-25T07:22:39Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1990-09-
dc.identifier.citation전자공학회논문지, pp.1409 - 11418-
dc.identifier.issn1975-2377-
dc.identifier.urihttp://hdl.handle.net/10203/60522-
dc.languageKorean-
dc.publisher대한전자공학회-
dc.title고속 열 확산 공정에 의해 형성된 Phosphorus Source/Drain을 갖는 NMOS 트랜지스터의 특성-
dc.typeArticle-
dc.type.rimsART-
dc.citation.beginningpage1409-
dc.citation.endingpage11418-
dc.citation.publicationname전자공학회논문지-
dc.contributor.nonIdAuthor조병진-
dc.contributor.nonIdAuthor김정규-
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