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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Initiated Chemical Vapor Deposition: A Versatile Tool for Various Device Applications Yu, Seung Jung; Pak, Kwanyong; Kwak, Moo Jin; Joo, Munkyu; Kim, Bong Jun; OH, Myung Seok; Baek, Jieung; Park, Hongkeun; Choi, Goro; Kim, Do Heung; Choi, Junhwan; Choi, Yunho; Shin, Jihye; Moon, Heeyeon; Lee, Eunjung; Im, Sung Gap, ADVANCED ENGINEERING MATERIALS, v.20, no.3, pp.1700622, 2018-03 |
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