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Effect of UV-O-2, NF3/H-2 surface preparation on the crystalline defects in silicon homoepitaxy (Part I. A study on photochemical surface preparation in series) Sun, MC; Kim, DoHyun; Kwon, SK, JOURNAL OF CRYSTAL GROWTH, v.237, no.2, pp.1399 - 1403, 2002-04 |
Silicon epitaxial film growth on silicon substrate exposed to UV-excited NF3/H-2 gas for native oxide removal Kwon, SK; Kim, DoHyun; Baek, JT, JOURNAL OF CRYSTAL GROWTH, v.198, no.2, pp.1039 - 1044, 1999-03 |
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