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Modeling and characterization of gas-phase etching of thermal oxide and TEOS oxide using anhydrous HF and CH3OH Lee, CS; Baek, JT; Yoo, Hyung Joun; Woo, Seong-Ihl, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.143, no.3, pp.1099 - 1103, 1996-03 |
Silicon epitaxial film growth on silicon substrate exposed to UV-excited NF3/H-2 gas for native oxide removal Kwon, SK; Kim, DoHyun; Baek, JT, JOURNAL OF CRYSTAL GROWTH, v.198, no.2, pp.1039 - 1044, 1999-03 |
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