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Effects of chemical reaction on the polishing rate and surface planarity in the copper CMP Bae, SH; Yang, Seung-Man; Kim, DoHyun, KOREA-AUSTRALIA RHEOLOGY JOURNAL, v.14, no.2, pp.63 - 70, 2002-06 |
Preparations of silica slurry for wafer polishing via controlled growth of commercial silica seeds So, JH; Bae, SH; Yang, Seung-Man; Kim, DoHyun, KOREAN JOURNAL OF CHEMICAL ENGINEERING, v.18, no.4, pp.547 - 554, 2001-07 |
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