Browse "CBE-Conference Papers(학술회의논문)" by Author Kim, JT
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| Characteristics of silylation and wet develop in Novolac/Diazonaphthoquinone resist Kim, JT; Kim, NY; Park, HK; Woo, Seong-Ihl, 3rd IUMRS Conference Symposium S, IUMRS, 1993 |
| Charaterization of Silylation and Wet Develop in Novolac/diazonaphthoquinone Resist System Kim, JT; Woo, Seong-Ihl, International Workshop on Process and Device of scaled LSI'S, pp.69 - 75, 1993 |
| New fine patterning method of positive photoresist by silylation/wet develop Kim, JT; Woo, Seong-Ihl, Semiconductor mat., comp. and computer aided VLSI, pp.142 - 145, 1993 |
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