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Effect of Diluent Gas and Rapid Thermal Annealin gon the Properties of Plasma Deposited Silicon Nitride Films Nam, CW; Woo, Seong-Ihl; Kim, YT; Min, SK, International Conference on VLSI and CAD, pp.356 - 359, 1991 |
Effects of PECVD Process Parameters on a Si:H Thin Films Kim, JH; Woo, Seong-Ihl; Kim, YT; Min, SK, The Society of Physics Fall Symposium, The Society of Physics, 1988 |
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