Corrosion Behavior of TiN Films Obtained by Plasma Assisted Chemical Vapor Deposition

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Titanium nitride (TiN) coatings with a dense structure were prepared on high-speed steel by plasma-assisted chemical vapour deposition (PACVD). The electrochemical polarization measurement of TiN coating was compared with that of the uncoated substrate. It was found that the TIN coating had a higher corrosion potential, and a lower corrosion rate (current density), about three orders of magnitude less than for the steel substrate. The major corrosion mechanism of TiN was pitting corrosion through surface defects and/or open pores. The number and size of pits decreased with the chlorine content of the film. The TiN coating deposited by PACVD, regardless of the amount of residual chlorine, proved to be a good anticorrosion coating on a steel substrate.
Publisher
Springer
Issue Date
1994
Language
English
Article Type
Article
Keywords

COATINGS; STEEL

Citation

JOURNAL OF MATERIALS SCIENCE, v.29, no.7, pp.1818 - 1824

ISSN
0022-2461
URI
http://hdl.handle.net/10203/59949
Appears in Collection
RIMS Journal Papers
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