EFFECTS OF DEPOSITION TEMPERATURE, SAMPLE THICKNESS AND DOPING ON THE MICROSTRUCTURES OF A-SI-H

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dc.contributor.authorYANG, SHko
dc.contributor.authorLee, Choochonko
dc.date.accessioned2013-02-25T01:15:39Z-
dc.date.available2013-02-25T01:15:39Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1983-
dc.identifier.citationJOURNAL OF NON-CRYSTALLINE SOLIDS, v.59-6, no.DEC, pp.759 - 762-
dc.identifier.issn0022-3093-
dc.identifier.urihttp://hdl.handle.net/10203/58684-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE BV-
dc.titleEFFECTS OF DEPOSITION TEMPERATURE, SAMPLE THICKNESS AND DOPING ON THE MICROSTRUCTURES OF A-SI-H-
dc.typeArticle-
dc.identifier.wosidA1983RZ94400026-
dc.type.rimsART-
dc.citation.volume59-6-
dc.citation.issueDEC-
dc.citation.beginningpage759-
dc.citation.endingpage762-
dc.citation.publicationnameJOURNAL OF NON-CRYSTALLINE SOLIDS-
dc.identifier.doi10.1016/0022-3093(83)90282-X-
dc.contributor.nonIdAuthorYANG, SH-
dc.type.journalArticleArticle-
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