DC Field | Value | Language |
---|---|---|
dc.contributor.author | Y.I.Choi | ko |
dc.contributor.author | Kim, Choong Ki | ko |
dc.contributor.author | Kwon, Young Se | ko |
dc.date.accessioned | 2013-02-24T13:35:30Z | - |
dc.date.available | 2013-02-24T13:35:30Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1986-02 | - |
dc.identifier.citation | IEE PROCEEDINGS - SOLID STATE AND ELECTRON DEVICES, v.133, no.1, pp.13 - 17 | - |
dc.identifier.issn | 0143-7100 | - |
dc.identifier.uri | http://hdl.handle.net/10203/57508 | - |
dc.language | English | - |
dc.publisher | Institution of Electrical Engineers. | - |
dc.title | Taper Etching of the Thermal Oxide Layer | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.citation.volume | 133 | - |
dc.citation.issue | 1 | - |
dc.citation.beginningpage | 13 | - |
dc.citation.endingpage | 17 | - |
dc.citation.publicationname | IEE PROCEEDINGS - SOLID STATE AND ELECTRON DEVICES | - |
dc.contributor.localauthor | Kwon, Young Se | - |
dc.contributor.nonIdAuthor | Y.I.Choi | - |
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