Taper Etching of the Thermal Oxide Layer

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dc.contributor.authorY.I.Choiko
dc.contributor.authorKim, Choong Kiko
dc.contributor.authorKwon, Young Seko
dc.date.accessioned2013-02-24T13:35:30Z-
dc.date.available2013-02-24T13:35:30Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1986-02-
dc.identifier.citationIEE PROCEEDINGS - SOLID STATE AND ELECTRON DEVICES, v.133, no.1, pp.13 - 17-
dc.identifier.issn0143-7100-
dc.identifier.urihttp://hdl.handle.net/10203/57508-
dc.languageEnglish-
dc.publisherInstitution of Electrical Engineers.-
dc.titleTaper Etching of the Thermal Oxide Layer-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume133-
dc.citation.issue1-
dc.citation.beginningpage13-
dc.citation.endingpage17-
dc.citation.publicationnameIEE PROCEEDINGS - SOLID STATE AND ELECTRON DEVICES-
dc.contributor.localauthorKwon, Young Se-
dc.contributor.nonIdAuthorY.I.Choi-
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EE-Journal Papers(저널논문)
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