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Showing results 1 to 8 of 8

1
Dually Patterned Self-assembled Monolayer via Si-containing Block Copolymer Lithography on Gold Substrate

Woo, Seung A; Ku, Sejin; Kim, Sumin; Kim, Jin-Baek, 한국고분자학회 2010년 추계 학술대회, 한국고분자학회, 2010-10-08

2
Dually Patterned Self-assembled Monolayer via Si-containing Block Copolymer Lithography on Gold Substrate

Woo, Seung A; Ku, Sejin; Kim, Sumin; Kim, Jin-Baek, 한국고분자학회 2010년 춘계 학술대회 , 한국고분자학회, 2010-04-08

3
Dually patterned self-assembled monolayers via silicon-containing block copolymer lithography on gold substrates and their applications

Woo, Seung A; Choi, Soo-Young; Bak, Chang Hong; Jo, Gyeong Cheon; Kim, Jin-Baek, Frontiers in Polymer Science 2013, Elsevier, 2013-05-21

4
High Resolution Bilayer Resists Using Blends of Photoresists and Silicon-Containing Materials

Woo, Seung A; Kim, Jin-Baek, 2011 KAIST-Kyoto University Chemistry Symposium, 2011-02-17

5
High resolution nonchemically amplified resists (Non-CARs) for extreme ultraviolet

Woo, Seung A; Choi, Soo-Young; Ku, Se Jin; Kim, Jin-Baek, 2012 Advanced lithography, SPIE Advanced Lithography, 2012-02-14

6
Improved Top Surface Imaging Process for High Aspect Ratio Patterns

Woo, Seung A; Park, Jiyoung; Kim, Sumin; Kim, Jin-Baek, 한국고분자학회 2009년도 추계 학술대회 , 한국고분자학회, 2009-10-08

7
Simple Top Surface Imaging System by Blending Photoresists and Silicon-containing materials

Woo, Seung A; Kim, Jin-Baek, 한국고분자학회 2010년 춘계 학술대회 , 한국고분자학회, 2010-04-08

8
Study of nano-patterning using silicon-containing materials = 실리콘을 포함하는 물질을 이용한 나노 패터닝에 관한 연구link

Woo, Seung A; 우승아; et al, 한국과학기술원, 2013

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