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1
A new photoresist based on hyperbranched poly(arylene ether phosphine oxide)

In, I; Lee, H; Fujigaya, T; Okazaki, M; Ueda, M; Kim, Sang Youl, POLYMER BULLETIN, v.49, no.5, pp.349 - 355, 2003-01

2
A positive-working alkaline developable photoresist based on partially tert-Boc-protected calix[4]resorcinarene and a photoacid generator

Young-Gil, K; Kim, Jin-Baek; Fujigaya, T; Shibasaki, Y; Ueda, M, JOURNAL OF MATERIALS CHEMISTRY, v.12, no.1, pp.53 - 57, 2002

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