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1
INVESTIGATION OF INITIAL FORMATION OF ALUMINUM NITRIDE FILMS BY SINGLE PRECURSOR ORGANOMETALLIC CHEMICAL-VAPOR-DEPOSITION OF [ME2AL(MU]NHR)]2 (R=IPR, TBU)

SUNG, MM; JUNG, HD; LEE, JK; Kim, Sehun; PARK, JT; KIM, Y, BULLETIN OF THE KOREAN CHEMICAL SOCIETY, v.15, no.1, pp.79 - 83, 1994-01

2
PREPARATION OF ALUMINUM NITRIDE THIN-FILMS USING SINGLE PRECURSOR OMCVD

Park, Joon Taik; LEE, JK; Kim, Sehun; SUNG, MM; KIM, Y, BULLETIN OF THE KOREAN CHEMICAL SOCIETY, v.14, no.2, pp.163 - 164, 1993-04

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