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Browse "Dept. of Chemistry(화학과)" by Author Jung, MH

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Showing results 1 to 7 of 7

1	A novel water developable photoresist for deep UV lithography Kim, Jin-Baek; Jung, MH; Chang, KH, EUROPEAN POLYMER JOURNAL, v.33, no.8, pp.1239 - 1243, 1997
2	Acid diffusion control in chemically amplified resists Kim, Jin-Baek; Choi, JH; Kwon, YG; Jung, MH; Chang, KH, POLYMER, v.40, no.4, pp.1087 - 1089, 1999-02
3	Control of photogenerated acid diffusion and evaporation by copolymerization with a basic monomer Kim, Jin-Baek; Kwon, YG; Choi, JH; Jung, MH, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.17, no.5, pp.2097 - 2102, 1999
4	Copolymers of camphorsulfonyloxymaleimide and t-BOC protected vinyllactams for applications as single-component resists Kim, ST; Kim, Jin-Baek; Jung, MH; Ahn, KD, POLYMER BULLETIN, v.39, no.4, pp.423 - 430, 1997
5	Poly(isobornyl methacrylate-co-3-(t-butoxycarbonyl)-1-vinyl-2-caprolactam) for an environmentally stable chemically amplified resist Kim, Jin-Baek; Choi, JH; Kim, H; Kwon, YG; Jung, MH, POLYMER JOURNAL, v.31, no.9, pp.695 - 699, 1999
6	Synthesis and polymerization of 3-(t-butoxycarbonyl)-1-vinylcaprolactam and application as deep UV resists Kim, Jin-Baek; Jung, MH; Chang, KH, POLYMER BULLETIN, v.38, no.3, pp.241 - 247, 1997-03
7	Synthesis of copolymers containing 3-hydroxycyclohexyl methacrylate and their application as ArF excimer laser resists Kim, Jin-Baek; Kim, JY; Jung, MH, POLYMER, v.40, no.1, pp.273 - 276, 1999-01

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