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New base-soluble positive-working photosensitive polyimides having o-nitrobenzyl ester group Choi, KH; Jung, JC; Kim, KS; Kim, Jin-Baek, POLYMERS FOR ADVANCED TECHNOLOGIES, v.16, no.5, pp.387 - 392, 2005-05 |
Svnthesis and micropatterning properties of a novel base-soluble, positive-working, photosensitive polyirnide having an o-nitrobenzyl ether group Shin, GJ; Jung, JC; Chi, JH; Oh, TH; Kim, Jin-Baek, JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.45, no.5, pp.776 - 788, 2007-03 |
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