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Photobleaching Photoacid Generator for ArF Lithography Jang, Ji Hyun; Kim, Jin-Baek, 대한화학회 제87회 춘계총회, pp.0 - 0, 대한화학회, 2001-04 |
Photoresist using dioxaspiro ring-substituted acryl derivatives Kim, Jin-Baek; Park, Jong Jin; Jang, Ji Hyun |
Synthesis and lithographic characterization of 1,4-dioxaspiro[4.7]dodecane-2-methyl methacrylate Kim, Jin-Baek; Jang, Ji Hyun; Park, Jong Jin, 한국고분자학회 1998년도 추계 학술대회 , pp.284 - 285, 한국고분자학회, 1998-10 |
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