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Poly(5-((2-trimethylsilyl-2-propyl)oxycarbonyl)-norbornene-co-maleic anhydride) for 193-nm lithography Kim, Jin-Baek; Lee, JJ; Kang, JS, POLYMER, v.41, no.18, pp.6939 - 6942, 2000-08 |
Poly(t-butyl-3 alpha-(5-norbomene-2-carbonyloxy)-7 alpha,12 alpha-dihydroxy-5 beta-cholan-24-oate-co-maleic anhydride) for a 193-nm photoresist Kim, Jin-Baek; Lee, BW; Kang, JS; Seo, DC; Roh, CH, POLYMER, v.40, no.26, pp.7423 - 7426, 1999-12 |
Synthesis of a novel methacrylate, (1,4-dioxa-8-methacrylate amide spiro [4,5] decane) monomer and its co-polymerization with t-butyl-3 alpha-methacryloxy-7 alpha, 12 alpha-dihydroxy-5 beta cholan-24-oate for 193 nm photoresist Karak, N; Ko, JS; Kim, Jin-Baek, JOURNAL OF POLYMER MATERIALS, v.19, pp.365 - 372, 2002-12 |
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