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Fabrication of versatile nanoporous templates with high aspect ratios by incorporation of Si-containing block copolymer into the lithographic bilayer system Kim, Su Min; Ku, Se Jin; Jo, Gyeong Cheon; Bak, Chang Hong; Kim, Jin-Baek, POLYMER, v.53, no.11, pp.2283 - 2289, 2012-05 |
Nanoporous hard etch masks using silicon-containing block copolymer thin films Ku, Se-Jin; Kim, Su-Min; Bak, Chang-Hong; Kim, Jin-Baek, POLYMER, v.52, no.1, pp.86 - 90, 2011-01 |
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