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A study on the formation and characteristics of the Si-O-C-H composite thin films with low dielectric constant for advanced semiconductor devices Yang, CS; Oh, KS; Ryu, JY; Kim, DC; Shou-Yong, J; Choi, CK; Lee, HJ; et al, THIN SOLID FILMS, v.390, no.1-2, pp.113 - 118, 2001-06 |
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