Browse "Dept. of Physics(물리학과)" by Subject PLASMA SOURCE ICP ETCH RADICALRY
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| 신공정을 위한 플라즈마 소스의 특성연구와 제어변수의 개발 = On the characteristics of the plasma sources for the new processeslink 엄세훈; Uhm, Sae-Hoon; et al, 한국과학기술원, 2004 |
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