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Showing results 1 to 4 of 4

1
Characteristics of the Deposition Rate per Unit Power on Pulsed-DC Magnetron Sputtering Source

An, Sang-Hyuk; In, Jung-Hwan; Chang, Hong-Young, PLASMA PROCESSES AND POLYMERS, v.6, no.12, pp.855 - 859, 2009-12

2
Diode laser-induced fluorescence measurements of metastable argon ions in a magnetized inductively coupled plasma

Jun, S; Chang, Hong-Young; McWilliams, R, PHYSICS OF PLASMAS, v.13, pp.122 - 123, 2006-05

3
Electron temperature analysis of two-gas-species inductively coupled plasma

Bai, KH; Chang, Hong-Young; Uhm, HS, APPLIED PHYSICS LETTERS, v.79, no.11, pp.1596 - 1598, 2001-09

4
Investigation of self-oscillation using particle balance model

Bae, Inshik; Na, Byungkeun; Chang, Hongyoung, PHYSICS OF PLASMAS, v.22, no.8, pp.082101, 2015-08

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