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Showing results 1 to 7 of 7

1
Capacitive Electron Cooling in an Inductively Coupled Plasma Source/Capacitively Coupled Plasma Bias Reactor

Jun, Hyun-Su; Lee, Dong-Seok; Chang, Hong-Young, JAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.10, 2013-10

2
Characterization of a high-frequency inductively coupled plasma source

Lee, DS; Jun, HS; Chang, Hong-Young, THIN SOLID FILMS, v.506, pp.469 - 473, 2006-05

3
Effect of reactor surface modification on the neutral gas temperature in a transformer-coupled toroidal plasma

You, Daeho; Lee, Yun-Seong; Lee, Jeong Beom; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.15, no.3, pp.183 - 189, 2015-03

4
Horn-array haloscope for volume-efficient broadband axion searches

Jeong, Junu; Youn, Sungwoo; Semertzidis, Yannis K., PHYSICAL REVIEW D, v.108, no.5, 2023-09

5
Numerical investigation on plasma and poly-Si etching uniformity control over a large area in a resonant inductively coupled plasma source

S. S. Kim; S. Hamaguchi; N. S. Yoon; Chang, Choong-Seock; Y. D. Lee; S. H. Ku, PHYSICS OF PLASMAS, v.8, no.4, pp.1384 - 1394, 2001-04

6
On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes

Lee, Jinwon; Lee, Yun-Seong; Chang, Hong-Young; An, Sang-Hyuk, PHYSICS OF PLASMAS, v.21, no.8, 2014-08

7
Radial density profile change near lower hybrid frequency in M=0 helicon wave plasmas

Yun, SM; Chang, Hong-Young, PHYSICS LETTERS A, v.248, no.5-6, pp.400 - 404, 1998-11

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