평면 마그네트론 스퍼터링 시스템에서의 타겟 효율 향상을 위한 연구Enhancement of target utilization in a planar magnetron sputtering system

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dc.contributor.advisor이원종-
dc.contributor.advisorLee, Won-Jong-
dc.contributor.author서태원-
dc.contributor.authorSeo, Tae-Won-
dc.date.accessioned2011-12-15T01:46:27Z-
dc.date.available2011-12-15T01:46:27Z-
dc.date.issued2004-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=238324&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/51610-
dc.description학위논문(석사) - 한국과학기술원 : 신소재공학과, 2004.2, [ v, 52 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject마그네트론 스퍼터링-
dc.subjectMAGNETRON SPUTTERING-
dc.title평면 마그네트론 스퍼터링 시스템에서의 타겟 효율 향상을 위한 연구-
dc.title.alternativeEnhancement of target utilization in a planar magnetron sputtering system-
dc.typeThesis(Master)-
dc.identifier.CNRN238324/325007 -
dc.description.department한국과학기술원 : 신소재공학과, -
dc.identifier.uid020023291-
dc.contributor.localauthor서태원-
dc.contributor.localauthorSeo, Tae-Won-
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MS-Theses_Master(석사논문)
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