Synthesis and lithographic characterization of poly(N-p-(tert-butoxycarvbonyloxy)phenyl dimethacrylamide)폴리(N-파라-(터셔리-부톡시카르보닐옥시)페닐 디메타크릴아미드)의 합성 과및 리소그라피 특성

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dc.contributor.advisorKim, Jin-Baek-
dc.contributor.advisor김진백-
dc.contributor.authorKwon, Kyong-Il-
dc.contributor.author권경일-
dc.date.accessioned2011-12-15T01:45:53Z-
dc.date.available2011-12-15T01:45:53Z-
dc.date.issued1997-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=113323&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/51576-
dc.description학위논문(석사) - 한국과학기술원 : 신소재공학과, 1997.2, [ viii, 84 p. ]-
dc.description.abstractIn the present work, synthesis and lithographic characteristics of the poly(N-p-(tert-butoxycarbonyloxy)phenyl dimethacrylamide), poly(TBPDMA), which has a cyclic structure in the main chain has been studied. Monomer, N-p-(tert-butoxylcarbonyloxy)phenyl dimethacrylamide was cyclopolymerized in solution when heated with free radical initiator, AIBN (2,2``-azobisisobutyronitrile), yield soluble and fusible polymer that contain practically no unsaturation. The structure of polymer was confirmed by $^1H-NMR$, $^{13}C-NMR$, and FT-IR. The chemical changes of resist system due to deep UV irradiation were performed by using TGA, FT-IR, and UV spectrometer. We obtained 2 $\mum$ line positive image patterns. We knew that the new resist material has desirable properties such as high transparency in deep UV region, facile deprotection, proper sensitivity. Especially this resist material is worthy of notice. This system can be applied to ``Self-development photoresist`` which has not need to develope.eng
dc.languageeng-
dc.publisher한국과학기술원-
dc.subjectPoly[N-p-(tert-butoxycarbonyloxy)phenyl dimethacrylamide]-
dc.subjectSelf-development photoresist-
dc.subjectChemically amplified resist-
dc.subjectPhotolithography-
dc.subjectCyclopolymerization-
dc.subject고리화중합-
dc.subject자발현상성 포토레지스트-
dc.subject폴리[N-파라-(터셔리-부톡시카르보닐옥시)페닐 디메타크릴아미드]-
dc.subject화학증폭형 레지스트-
dc.subject광미세가공-
dc.titleSynthesis and lithographic characterization of poly(N-p-(tert-butoxycarvbonyloxy)phenyl dimethacrylamide)-
dc.title.alternative폴리(N-파라-(터셔리-부톡시카르보닐옥시)페닐 디메타크릴아미드)의 합성 과및 리소그라피 특성-
dc.typeThesis(Master)-
dc.identifier.CNRN113323/325007-
dc.description.department한국과학기술원 : 신소재공학과, -
dc.identifier.uid000947502-
dc.contributor.localauthorKwon, Kyong-Il-
dc.contributor.localauthor권경일-
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MS-Theses_Master(석사논문)
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