플라즈마 화학증착법을 이용한 수소화된 비정질 및 미세결정질 실리콘 박막의 제조Deposition of a-Si:H and μc-Si:H thin films by PECVD method
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 임호빈 | - |
| dc.contributor.advisor | Im, Ho-Bin | - |
| dc.contributor.author | 정병후 | - |
| dc.contributor.author | Jung, Byung-Hoo | - |
| dc.date.accessioned | 2011-12-15T01:42:58Z | - |
| dc.date.available | 2011-12-15T01:42:58Z | - |
| dc.date.issued | 1992 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=60419&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/51395 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 전자재료공학과, 1992.2, [ [iii], 48 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.title | 플라즈마 화학증착법을 이용한 수소화된 비정질 및 미세결정질 실리콘 박막의 제조 | - |
| dc.title.alternative | Deposition of a-Si:H and μc-Si:H thin films by PECVD method | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 60419/325007 | - |
| dc.description.department | 한국과학기술원 : 전자재료공학과, | - |
| dc.identifier.uid | 000901485 | - |
| dc.contributor.localauthor | 임호빈 | - |
| dc.contributor.localauthor | Im, Ho-Bin | - |
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- MS-Theses_Master(석사논문)
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