Glue layer TiW sputtering 조건이 저압 화학 증착 방법에 의해 증착된 텅스텐 박막의 성질에 미치는 영향에 관한 연구A study on the effect of sputtering conditions of glue layer TiW on the properties of LPCVD-W films

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dc.contributor.advisor천성순-
dc.contributor.advisorChun, Soung-Soon-
dc.contributor.author박진성-
dc.contributor.authorPark, Jin-Seong-
dc.date.accessioned2011-12-15T01:40:16Z-
dc.date.available2011-12-15T01:40:16Z-
dc.date.issued1993-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=68555&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/51229-
dc.description학위논문(석사) - 한국과학기술원 : 전자재료공학과 , 1993.2, [ [iii], 62 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subjectChemical vapor deposition.-
dc.titleGlue layer TiW sputtering 조건이 저압 화학 증착 방법에 의해 증착된 텅스텐 박막의 성질에 미치는 영향에 관한 연구-
dc.title.alternativeA study on the effect of sputtering conditions of glue layer TiW on the properties of LPCVD-W films-
dc.typeThesis(Master)-
dc.identifier.CNRN68555/325007-
dc.description.department한국과학기술원 : 전자재료공학과 ,-
dc.identifier.uid000911275-
dc.contributor.localauthor박진성-
dc.contributor.localauthorPark, Jin-Seong-
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MS-Theses_Master(석사논문)
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