DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 천성순 | - |
dc.contributor.advisor | Chun, Soung-Soon | - |
dc.contributor.author | 김형석 | - |
dc.contributor.author | Kim, Hyung-Suk | - |
dc.date.accessioned | 2011-12-15T01:40:14Z | - |
dc.date.available | 2011-12-15T01:40:14Z | - |
dc.date.issued | 1993 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=68554&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/51228 | - |
dc.description | 학위논문(석사) - 한국과학기술원 : 전자재료공학과, 1993.2, [ iii, 83 p. ] | - |
dc.language | kor | - |
dc.publisher | 한국과학기술원 | - |
dc.title | 플라즈마 화학증착된 Aluminum oxide 박막의 $CF_4$와 $CC1_4$ 플라즈마에서의 Reactive ion etching 특성 | - |
dc.title.alternative | The $CF_4/CC1_4$ reactive ion etching properties of aluminum oxide films deposited by PECVD | - |
dc.type | Thesis(Master) | - |
dc.identifier.CNRN | 68554/325007 | - |
dc.description.department | 한국과학기술원 : 전자재료공학과, | - |
dc.identifier.uid | 000911182 | - |
dc.contributor.localauthor | 김형석 | - |
dc.contributor.localauthor | Kim, Hyung-Suk | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.