플라즈마 화학증착법에 의하여 증착된 aluminum oxide 박막의 C-V 특성에 증착 변수가 미치는 영향The effect of deposition parameters on C-V characteristics of aluminum oxide thin films deposited by PECVD

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dc.contributor.advisor천성순-
dc.contributor.advisorChun, Soung-Soon-
dc.contributor.author김용천-
dc.contributor.authorKim, Yong-Chun-
dc.date.accessioned2011-12-15T01:39:30Z-
dc.date.available2011-12-15T01:39:30Z-
dc.date.issued1990-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=67533&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/51182-
dc.description학위논문(석사) - 한국과학기술원 : 재료공학과, 1990.2, [ [iv], 90 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subjectElectrical properties-
dc.title플라즈마 화학증착법에 의하여 증착된 aluminum oxide 박막의 C-V 특성에 증착 변수가 미치는 영향-
dc.title.alternativeThe effect of deposition parameters on C-V characteristics of aluminum oxide thin films deposited by PECVD-
dc.typeThesis(Master)-
dc.identifier.CNRN67533/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000881080-
dc.contributor.localauthor천성순-
dc.contributor.localauthorChun, Soung-Soon-
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MS-Theses_Master(석사논문)
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