고온열처리가 측면고상결정화시킨 다결정 Si 박막의 미세구조와 박막트랜지스터 특성에 미치는 영향 연구Effect of high-temperature annealing on the microstructure of polycrystalline Si films crystallized by lateral growth and its effect on TFT characteriscs

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dc.contributor.advisor안병태-
dc.contributor.advisorAhn, Byung-Tae-
dc.contributor.author이계웅-
dc.contributor.authorLee, Kye-Ung-
dc.date.accessioned2011-12-15T01:35:26Z-
dc.date.available2011-12-15T01:35:26Z-
dc.date.issued2003-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=180293&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50928-
dc.description학위논문(석사) - 한국과학기술원 : 재료공학과, 2003.2, [ iii, 78 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject박막트랜지스터-
dc.subject측면고상결정화-
dc.subjectmetal induced lateral crystallization-
dc.subjecthigh-temperature annealing-
dc.subjectpoly-Si TFT-
dc.title고온열처리가 측면고상결정화시킨 다결정 Si 박막의 미세구조와 박막트랜지스터 특성에 미치는 영향 연구-
dc.title.alternativeEffect of high-temperature annealing on the microstructure of polycrystalline Si films crystallized by lateral growth and its effect on TFT characteriscs-
dc.typeThesis(Master)-
dc.identifier.CNRN180293/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid020013400-
dc.contributor.localauthor안병태-
dc.contributor.localauthorAhn, Byung-Tae-
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