고집적 FRAM 메모리에서 Ir과 Ru의 확산방지막으로서의 특성평가Characteristics of Ir and Ru as diffusion barrier for highly integrated memory devices
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 김호기 | - |
| dc.contributor.advisor | Kim, Ho-Gi | - |
| dc.contributor.author | 한귀영 | - |
| dc.contributor.author | Han, Kwi-Young | - |
| dc.date.accessioned | 2011-12-15T01:33:22Z | - |
| dc.date.available | 2011-12-15T01:33:22Z | - |
| dc.date.issued | 2000 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=162666&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50804 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 2000.8, [ iv, 76 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.title | 고집적 FRAM 메모리에서 Ir과 Ru의 확산방지막으로서의 특성평가 | - |
| dc.title.alternative | Characteristics of Ir and Ru as diffusion barrier for highly integrated memory devices | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 162666/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000983836 | - |
| dc.contributor.localauthor | 김호기 | - |
| dc.contributor.localauthor | Kim, Ho-Gi | - |
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