D.C. 마그네트론 반응성 스퍼터링법으로 증착한 ITO박막에 있어서 고유응력, 배향성 그리고 밀도가 비저항에 미치는 영향Effect of density, intrinsic stress and crystallographic orientation on resistivity of ITO thin films deposited by D.C. magnetron reactive sputtering
- Advisors
- 최시경researcher; Choi, Si-Kyungresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2000
- Identifier
- 158616/325007 / 000983444
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 2000.2, [ iv, 74 p. ]
- Keywords
밀도; 응력; 산화물 전극; 마그네트론 스퍼터링; Magnetron sputtering; Density; Stress; ITO
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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