(A) study on the effects of sulphate and nitrate ion additives on pit growth of pure aluminium in 0.1 M NaCl solution0.1 M NaCl 수용액에서 순수한 알루미늄의 핏트 성장에 미치는 황산/질산 이온 첨가제의 영향에 대한 연구

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The effects of sulphate $(SO_{4}^{2-})$ and nitrate $(NO_{3}^{-})$ ion additives on pit growth of pure aluminium (Al) have been investigated in 0.1 M NaCl solution as a function of anion concentration using potentiodynamic polarization experiment, potentiostatic current transient technique and optical microscopy. The increase in $SO_{4}^{2-}$ and $NO_{3}^{-}$ ion concentrations in NaCl solution raised the pitting potential E_{pit} of pure Al in value and at the same time the steady-state current density at potentials much higher than the $E_{pit}$ on the potentiodynamic polarization curves. This means that $SO_{4}^{2-}$ and $NO_{3}^{-}$ ion additives impede the pit initiation on pure Al surface, but enhance the growth of pre-existing pits. In order to experimentally establish the condition for pure pit growth process, we artificially made a pit on pure Al surface. Potentiostatic current transients obtained from the moment just after adding $SO_{4}^{2-}$ and $NO_{3}^{-}$ ions to NaCl solution revealed that the artificial pit grows more rapidly in the presence of $SO_{4}^{2-}$ and $NO_{3}^{-}$ ions than the absence over time. From observation of the cross-sectional views of the artificial pit, it appeared that the pit grows preferentially in the lateral direction and in the downward direction by adding $SO_{4}^{2-}$ and $NO_{3}^{-}$ ions to NaCl solution, respectively. Based upon the experimental results, two different pit growth promotion mechanisms by anion additives can be proposed: promotion by preferential attack of $SO_{4}^{2-}$ ions more mobile than $Cl^{-}$ ions in $SO_{4}^{2-}$ ion-containing solution; promotion by the production of nitrate salt from $NO_{3}^{-}$ ions more oxidizing than chloride salt from $Cl^{-}$ ions in $NO_{3}^{-}$ ion-containing solution. Both cases may enhance the dissolution of bare Al metal, thus accelerating the pit growth of pure Al in NaCl solution.``
Advisors
Pyun, Su-Il변수일
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2000
Identifier
158602/325007 / 000983178
Language
eng
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 2000.2, [ vii, 62 p. ]

Keywords

Aluminium; Pitting corrosion; Ion additive; Chloride ion; 염화이온; 알루미늄; 공식; 이온 첨가제

URI
http://hdl.handle.net/10203/50775
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=158602&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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