Molybdenum을 이용한 photomask blank 재료에 관한 연구A study on the photomask blank material based on molybdenum
- Advisors
- 노광수researcher; No, Kwang-Sooresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1999
- Identifier
- 150063/325007 / 000973238
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1999.2, [ iv, 79 p. ]
- Keywords
크롬; 흡수층; 몰리브덴; 포토마스크; 건식식각; Dry etch; Chromium; Absorber; Molybdenum; Photomask
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.